Thin Films For Novel Oxide Devices (THIOX)

More about the programme

The potential of these materials is thus very high, but the some of the key factors which control the physics, for instance the doping level and the structure, are also often difficult to control in films. Moreover, the compatibility of different oxides in terms of interface structure and electronic properties is a poorly understood issue; as are the effects of (substrate-induced) strain. In all cases, structural and electronic properties depend on deposition method and growth conditions which have to be well understood and sensitively controlled. Advanced devices and fine tuning of the electronic properties of these materials require further research in these areas.

The large amount of parameters and the machinery required for fabrication and analysis make it impossible for any single group to get a firm grip on these questions, especially since they are strongly interdisciplinary in nature.

What is needed, and what is aimed for, is more interaction between groups working on physical properties, on growth studies, and on structural / chemical analysis at the atomic level. The groups involved in this proposal all play a leading international role in their subfields but signal a need for stronger awareness of all aspects of the material science if tailoring of multilayered oxide structures for specific applications is to be successful. This is not a specific European but rather a worldwide problem, and a concerted European action would strongly aid in putting European groups at the forefront of this technologically promising research area.

R & D keywords: Hybrid oxides; tailored film growth; oxide-based devices.

Publications

THIOX brochure (PDF 193 KB)