Elementary steps of layer growth in the fabrication of novel materials by atomic layer epitaxy (ALENET)

UgoBardiE-Mail
Università di FirenzeDipartimento di ChimicaFirenzeItaly
Hidde H.BrongersmaE-Mail
Eindhoven University of TechnologyFaculty of Technical PhysicsEindhovenNetherlands
Jean-ClaudeBertoliniE-Mail
CNRS 2Institut de Recherche sur la CatalyseVilleurbanneFrance
ClaudeCreemersE-Mail
K.U. LeuvenFysico-chemisch LaboratoriumLeuvenBelgium
GernotFriedbacherE-Mail
University of ViennaInstitute of Analytical ChemistryViennaAustria
Maria LuisaForestiE-Mail
Università di FirenzeDepartment of ChemistryFirenzeItaly
WernerHeilandE-Mail
Universität OsnabrückFB PhysikOsnabrückGermany
MarkkuLeskeläE-Mail
University of HelsinkiDepartment of ChemistryLaboratory of Inorganic ChemistryHelsinkiFinland
Julian R.H.RossE-Mail
University of LimerickCollege of sciencesChemical & Environmental Sciences DepartmentLimerickIreland
TuomoSuntolaE-Mail
Neste CorporationEspooFinland
EdmundTaglauerE-Mail
Max Planck Institut für Plasmaphysik (IPP)Garching bei MünchenGermany
Pascalvan der VoortE-Mail
University of AntwerpDepartment of ChemistryLaboratory of Adsorption & CatalysisWilrijkBelgium
Robvan WelzenisE-Mail
Technical University of EindhovenFaculty of Technical PhysicsEindhovenNetherlands
ChantalDurantE-Mail
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